Expertech LPCVD Furnace
Asset # :
78876
Equipment Make:
Expertech
Equipment Model:
Type:
LPCVD Furnace
Wafer Size:
Equipment Configuration:
- Consists of 4 tubes
- 2 tubes operate at atmospheric pressure
- 2 for LPCVD processes
- Tube 1 (atmospheric) is configured for diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C)
- Tube 2 (atmospheric) is configured for forming gas anneal (up to 800C)
- LPCVD SiO2 deposition at lower temperatures (up to 800C) is available in Tube 3
- LPCVD Si3N4 (up to 800C) in Tube 4
- The gaskets and front line module in the 2 vacuum tubes may need replacement
- 2 tubes operate at atmospheric pressure
- 2 for LPCVD processes
- Tube 1 (atmospheric) is configured for diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C)
- Tube 2 (atmospheric) is configured for forming gas anneal (up to 800C)
- LPCVD SiO2 deposition at lower temperatures (up to 800C) is available in Tube 3
- LPCVD Si3N4 (up to 800C) in Tube 4
- The gaskets and front line module in the 2 vacuum tubes may need replacement
Equipment Pictures:
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Added: April 25, 2024
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