Applied Materials NAR 1200 L Vertical In Line Sputtering Machine

Asset # : 65090
Equipment Make: Applied Materials
Equipment Model: NAR 1200 L
Type: Vertical In-Line Sputtering Machine
Wafer Size:
Equipment Configuration:

– Cycle Time: 40sec
– Glass Size: 730mm x 920mm
Vacuum Data:
– Entrance / exit chamber: < 2 E-02 hPa - Transfer chamber: < 5 E-06 hPa - Process chamber: < 5 E-06 hPa Productivity: - Throughput: 180 Substrates/h (2 subs/carrier) - Target Utilization: > 40% ave
– Substrate Dims: 730mm x 920mm x (0.4 – 1.1) mm
– Carrier Dims: approx 1800 mmL / 1718 mmH
– No masking
– Pirani vacuum meter: 10-3 hPa to 1*10-3 hPa
– Ionization gauge range: 10-2 hPa to 1*10-9 hPa
– Capacitance vacuum meter sensor head range: 10-2 hPa to 10-4 hPa
– High vacuum pump set: Turbo-molecular pump Adixen ATH1603M
– Rough vacuum pumps: SP630 plus WSU 2001
– Mo cathode: DC power supply ADL 25 kw x 3
– Al cathode: DC power supply ADL 25 kw x 3
– Type: Planar cathode
– Material of backing plate: Ti, water cooled
– Magnetic field: Move mag
– Target fixing: bonding

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  • Added: April 28, 2022

  • Views: 55

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