Applied Materials P 5000 Mark II J Chemical Vapor Deposition (CVD)

Asset # : 62011
Equipment Make: Applied Materials
Equipment Model: P 5000 Mark II-J
Type: Chemical Vapor Deposition (CVD)
Wafer Size: 6"
Equipment Configuration:

– SBC Board Model: SV21
– Cassette Indexer: 6″ Clamp
– Elevator: 8 Slot
– Monitors: Qty 2
– Robots: Phase III
– Robot Blade: Standard Vacuum
– Wafer Sensor: Cap sensor
– Scrubber: New tech wave scrubber / NTWP601HW, 2 units
– Pump: Process pump 4 units / Edward IQDP80+QMB500
– Floppy: 3.5″ SCSI Driver
Chamber:
– Position: A/B/C/D
– Type: DLH 1-hole
– Process: SiH4 Oxide
– Heater type: lamp
– Susceptor type: AL
– Matcher: 4
– Throttle Valve: Delta Nitride Dual Spring
– Gas panel: Standard 20 channel
– Gas supply: Top down
– Manual valve: Fujikin

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  • Added: November 2, 2021

  • Views: 37

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