Applied Materials P 5000 Chemical Vapor Deposition (CVD)

Asset # : 62007
Equipment Make: Applied Materials
Equipment Model: P 5000
Type: Chemical Vapor Deposition (CVD)
Wafer Size:
Equipment Configuration:

– SBC Board Model: SV21
– Cassette Indexer: 6″ Clamp
– Elevator: 8 Slot
– Monitors: Qty 2
– Robots: Phase III
– Robot Blade: Standard Vacuum
– Wafer Sensor: Cap sensor
– Scrubber: GST Burn-Wet MK-111 1.8Mini, 2 units
– Pump: Process pump 3 units / Edward IQDP80+QMB500
– Floppy: 3.5″ SCSI Driver
Chamber:
– Position: A/B/D
– Type: DLH 1-hole
– Process: SiH4 Oxide
– Heater type: lamp
– Susceptor type: AL
– Matcher: 3
– Throttle Valve: Delta Nitride Dual Spring
– Gas panel: Standard 20 channel
– Gas supply: Top down
– Manual valve: Nupro

Equipment Pictures:

Send BTG Message:

Inquire

Ad Details

  • Added: November 1, 2021

  • Views: 34

Description

Tags :