Aixtron Crius II Metalorganic Chemical Vapor Deposition (MOCVD)
Asset # :
61526
Equipment Make:
Aixtron
Equipment Model:
Crius II
Type:
MOCVD
Wafer Size:
Equipment Configuration:
– Process: GaN
– Batch size: 2″ * 55ea/ 4″ * 13ea/ 6″ * 6ea
– Electricity: 208/120V AC, 3 Phase
– Heater voltage: 380V AC, 3 Phase
– Wiring: 4 wire + ground
– Temperature monitor: ARGUS x1
– Hydride lines: NH3_1 / NH3_2 / SiH4
– MO Source: TMGa-1,TMGa-3,
Equipment Pictures:
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Added: October 12, 2021
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Views: 70