Aixtron Crius II MOCVD

Asset # : 61526
Equipment Make: Aixtron
Equipment Model: Crius II
Type: MOCVD
Wafer Size:
Equipment Configuration:

– Process: GaN
– Batch size: 2″ * 55ea/ 4″ * 13ea/ 6″ * 6ea
– Electricity: 208/120V AC, 3 Phase
– Heater voltage: 380V AC, 3 Phase
– Wiring: 4 wire + ground
– Temperature monitor: ARGUS x1
– Hydride lines: NH3_1 / NH3_2 / SiH4
– MO Source:  TMGa-1,TMGa-3,TEGa2, Cp2Mg-1, Cp2Mg-2,
TMIn-1, TMAl-1 (7)
– Bath:
– 2 sets of RE235 RAUDA bath
– 4 sets of NOAH Precision
– MFC type: Horiba Z500
– Pump: Scroll pump *1
– Chiller: Affinity

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  • Added: October 12, 2021

  • Views: 15

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