Plasmatherm LAPECVD PM 3 Plasma Enhanced Chemical Vapor Deposition System

Asset # : 60981
Equipment Make: Plasmatherm
Equipment Model: LAPECVD PM 3
Type: PECVD
Wafer Size:
Equipment Configuration:

– 208V
– 50/60Hz
– 3 Phase
– 63 Amps
Equipment Pictures:
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Plasmatherm LAPECVD PM 3 Plasma Enhanced Chemical Vapor Deposition System 60981 Refurbished

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  • Added: August 24, 2021

  • Views: 43

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