Applied Materials 5200 Centura Dry Etch Cluster Tool

Asset # : 60361
Equipment Make: Applied Materials
Equipment Model: 5200 Centura
Type: Dry Etch Cluster Tool
Wafer Size:
Equipment Configuration:

3ea process chamber+clean, w/ RF supply cabinet containing:
– 1ea RFPP LF10A RF supply
– 1ea RFPP RF20R RF supply
– 3ea ENO IEM-12B3 RF generators
– Power supply cabinet, 208V, 60Hz, 139kVA
Includes:
– 4ea BOC Edwards QDP80 vacuum pumps
– 2ea BOC Edwards QDP40 vacuum pumps
– 3ea Neslab HX 150-CHX recirculating chillers
– 1ea Neslab Steelhead 1 CHX recirculating chiller

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  • Added: June 10, 2021

  • Views: 47

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