Ultratech AP 300 Exposure Station
Asset # :
57502
Equipment Make:
Ultratech
Equipment Model:
AP 300
Type:
Exposure Station
Wafer Size:
12"
Equipment Configuration:
– Reticle handling: 6 x 6 x 0.250″ with 6 Slot
– 2 Dial Illuminator System (1200W GHI Line)
– WEP System
– DSA System
– Lens Type: 2um (Gen2 Lens)
– Wafer Alignment System (MVS with PatMax)
– Field Size: 44 x 26.7 mm Stage
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Added: October 15, 2020
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Views: 403