Ultratech AP 300 Exposure Station

Asset # : 57502
Equipment Make: Ultratech
Equipment Model: AP 300
Type: Exposure Station
Wafer Size: 12"
Equipment Configuration:

– Reticle handling: 6 x 6 x 0.250″ with 6 Slot
– 2 Dial Illuminator System (1200W GHI Line)
– WEP System
– DSA System
– Lens Type: 2um (Gen2 Lens)
– Wafer Alignment System (MVS with PatMax)
– Field Size: 44 x 26.7 mm Stage

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  • Added: October 15, 2020

  • Views: 115

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