STS Multiplex Inductively Coupled Plasma (ICP) Sold

Asset # : 56556
Equipment Make: STS
Equipment Model: Multiplex
Type: Inductively Coupled Plasma (ICP)
Wafer Size:
Equipment Configuration:

– 8.32 KVA
– ICP Process Chamber
– Coil RF Generator and Matching Unit (Platen)
– Phase Shift Controller
– VAT Isolation Valve
– Turbo Pump
– Dry Pump
– Gas Box
– Cluster Multiplex Prime Power Distribution Cabinet Combined with the Process Chamber Electronics
– Materials Processed: Si, Si02, A1203, Ta, Ti
– Process Gasses: CF4, SF6, Ar, 02, H2

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  • Added: October 9, 2020

  • Views: 46

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