Applied Materials Centura SYS 5200 T MCVD System Sold

Asset # : 56004
Equipment Make: Applied Materials
Equipment Model: Centura SYS 5200 T
Type: MCVD System
Wafer Size: 8"
Equipment Configuration:

– 2 Chamber System: Tungsten Si, DCS (Chamber C will be removed from system, Only Chamber A&B are included)
– SMIF System: (Qty. 2) LPT 2000
– Process: PLYCD DCS
– Software version : B3.034
– Handler System: HP Robot Assembly
– Process Chms: Plycd DCS CHM A & B
– Ebara Pump Model A30W (Load Lock) (2)
– Ebara Pump Model A70W (Chamber) (2)
– RF Generators (3)
– Heat Exchanger AMAT0
– Neslab HX-150
– D150 Dual GRC System
– Guardian GS-4 Burn Box
– Chamber type: WSI -x
– Number of chambers: 2 (AB)
– Process: WSIx, DCS
– Heat exchange setpoint: 65C
– RF Generator: ENI 12B
– Neslab: HX-150
– GRC System: D 150 Dual

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  • Added: October 9, 2020

  • Views: 254

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