Applied Materials P 5000 Plasma Enhanced Chemical Vapor Deposition (PECVD) Sold

– Depo Rate: Oxide 6000Å/min
– Uniformity: 5% ↓
Gases: 12 Line:
– GAS 1 200 sccm Sih4
– GAS 2 100 sccm NH3
– GAS 3 3000 sccm N2
– GAS 4 2000 sccm N20
– GAS 5 2000 sccm CF4 or SF6
– GAS 6 n/a
– GAS 7 200 sccm Sih4
– GAS 8 100 sccm NH3
– GAS 9 3000 sccm N2