Asset # : 42099
Equipment Make: Lam
Equipment Model: Rainbow 4520
Type: Oxide Etch
Wafer Size:
Equipment Configuration:

(2) RF Carts
ESC
Optical non‐contact
Particle reduction
Orbital gas panel
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He flow control mode: Recipe modeNo auto clean
No grey area operating system
No LAM Station EPT
No heating of gas lines
No heating of exhausts
MTBC: 72 RF HoursClamping system
Generator: PDW 2200
Match: LoFAT
Throttle valveTemperature control
Chamber upper / Lower (Not heated)
Lower electrode temperature: 0°C
Upper electrode temperature: 40°CBallast & crossover
Crossover gas number: 1
Crossover gas flow: 300
Ballast gas number: 1
Ballast gas flow: 300Orbital gas panel
Gas 1: Ar, 1000 sccm
Gas 2: CF4, 200 sccm
Gas 3: CHF3, 100 sccm
Gas 4: N2, 50 sccm
Gas 5: O2, 20 sccm
Gas 6: SF6, 20 sccm
Gas 7: Ar, 100 sccm
Gas 8: CF4, 20 sccmChiller: 2080 Dual channel TCU

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  • Added: December 4, 2018

  • Views: 75

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