Oxford Plasmalab 80 Plus Plasma Enhanced Chemical Vapor Deposition (PECVD)

Asset # : 33849
Equipment Make: Oxford
Equipment Model: Plasmalab 80 Plus
Type: Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Wafer Size: - 4 Gasses: N2, O2, CF4, and Ar
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  • Added: May 21, 2019

  • Views: 331

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