Asset # : 20129
Equipment Make: MRC
Equipment Model: 903 M
Type: Three Target Inline Sputtering System
Wafer Size:
Equipment Configuration:

– MKS 252 Exhaust valve controller
– RGA not included(optional)
– 208 V
– 100.0 A
– 60 Hz
– 3 Phase

Equipment Pictures:

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  • Added: February 14, 2019

  • Views: 247

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