Oxford Plasmalab 100 ICP 180 Etcher
- Process: GaN Etch (Chlorine-based)
- Set for 4" wafers (max 6" with correct quartz clamp)
- Altacatel ATH1300M turbo pump 
- Chamber is still under vacuum. Prevents contamination. Unverified 4" clamp and chamber condition.
- Gas Config: HBr 50sccm, CL2 50sccm, BCL3 50sccm, O2 200sccm, CF4 100sccm, Ar 100
- AE Dressler HiLight133 RF Gen for Bias is non-OEM config.  Does not fit in the RF Gen mount correctly.  Custom external circuit to convert signals to the RF Gen.  Needs cleanup and re-engineering.
- Julabo F32 chiller is dirty and fluid is orange. May cause electrode failure.  
- At least one of the three Proteus flow switches is leaking dirty, orange chiller fluid
- VAT PM-5 Controller is partially pulled out of the frame
- Alcatel ACP type pump
- Rough Pump: Edwards QDP80 with Edwards TIM module. Externally powered. 
- Pump I/O cable is missing the DB shell
- Ocean Optics Endpoint detector is present, but no hardware to mount the fiber optic cable to the chamber window
- The VAT Slit door mechanism under the LL is missing it's covers
- Black insulation on the chiller lines is deteriorated and shedding black particles into the frame area
2011 Vintage