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Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer

Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer

Asset #: 80548

Make: Heidelberg

Model: DWL 2000

Last Confirm Date: June 19, 2024

Heidelberg DWL 2000 Laser Pattern Generator and Direct Writer
- Diode laser (air cooling):
- laser wavelength: 405 nm
- output power: 100 mW
- typical lifetime: 7500 hrs
- Write Mode I, feature size 0.6 µm, address grid 10 nm
- Optical Autofocus
- Environment chamber:
- laminar airflow (adjustable): 0.3 - 0.5 m/s
- temperature stability: ± 0.1*C (at ±1*C outside the box)
- air quality: Class 10 (if clean room is class 100 or better)
- Base granite with air cushions for vibration isolation
- Metrology system with macro and micro camera for measurements and alignment
- Air-gauge autofocus with a range of 80 um
- Stage system with linear motors, air bearings and interferometric position control:
- maximum substrate size: 9” x 9”
- maximum write area: 200 x 200 mm2 (min. 5 mm from substrate edge)
- substrate thickness: 0 to 7 mm
- position resolution: 10 nm
- Electronics for interferometer, stage and autofocus system, a real time pixel generator, and image processing hardware
- Control PCs for system control and data conversion
- Software: (OS9) and graphical user interface (MS Windows)
- Conversion software (Linux) for DXF, CIF, GDSII, and Gerber file formats

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