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Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 8026

Make: Applied Materials

Model: P 5000

Wafer Sizes: 6 inch

Last Confirm Date: March 24, 2016

Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition), 6"
System Mainframe:
- Mark II Mainframe, TTW Installation & TTW Monitor
- Remote Stand Alone Monitor qty. 2 (one chase, one sub-fab)
- Bolt down LL Lid & 100mm Cassette Handler, Phase III Robot
- 15 Slot Storage Elevator, Keyence IO Wafer Sensors, ZA Slit Valves
- 21 Slot Expanded VME Rack w/ 3
- Electro-polished fore lines
- GEMS Hardware

Chambers A, B, C, & D: Standard PECVD Process Chamber
- Oxy/Nitride Chamber Lid (P/N 0020-09879) ,
- 150mm Process Kit
- Lamp Heated Module (750W Lamps) & Phase IV RF Match Network
- Dual (10 Torr & 100 Torr) Baratron & Leak Check Port
- CVD Endpoint Module, Silane Nitride Throttle Valve

Gas Panel Configuration
- 28 Slot Gas Panel, 7:1 Gas Manifolds, Cajon/Swagelock fittings
- New In-line, POU Filters and SS Gas Lines,

Remote Hardware, to include:
- Modular Remote Frame
- OEM 12B RF Supply (qty. 4)
- AMAT-0 Heat Exchanger
- 25 ft. Remote rack cables
- 50 ft. Sub-fab cables (pumps, heat exchanger, etc.)

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