Yes G 1000 LMC Plasma Cleaner
- No. of trays & type: 8 Standard Shelves (6 inside and 2 spare)
- Type of pumps: Edwards iXH100 Vacuum Pump
- No. of  Mass Flow Controllers: 3 optional, for gas mixing capability
- No. of  Process Gas Inputs: 3 standard
- Type of Gases used: Oxygen and Nitrogen
- Operation Temp: 20 - 100*C
- N2 Flow Rate: 1.7 SCFM
- Process Gas Flow Rate: 20-50 SCCM average
- Interior Chamber Dims: 18 x 18 x 12"
- Chamber Material: 6061-T6 aluminum
- Process Gas Inputs: 3 standard, 4th optional
- SEMI Compliance: S2/S8
Software
- Number of Recipes: 12 with load / save / loop / link capability
- Range of Exposure Time: 0-1200 seconds (20 minutes)
- Resolution of Timer Setting: 1 second
Performance
- RF Plasma Power: 0-1000 watts @ 550 VAC, selectable power
- RF Leakage Magnetic: 0.6 mA/m, 4.15 x 10-7 A2/m2 Average
- RF Leakage Electrical: 1.6 V/m, 4.2 V2/m2 Average
- Nitrogen Consumption: 0 SCF idle, 6.8 SCF peak, 1.7 SCF average
- Power Consumption with Pump: 375W idle, 1000W peak, 640W average
- Reactant Gas Consumption: 0 SCF idle, 20-50 SCCM
- Heat Emission: 920 watts average
Power Requirements:
- 200-250V
- 20 amps
- 50/60 Hz
- 1 Phase