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STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)
STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)
STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)
STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)
STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)

STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma)

Asset #: 74337

Make: STS

Model: Multiplex ASE

Wafer Sizes: 6 inch

Last Confirm Date: October 04, 2023

STS Multiplex ASE ICP Deep Silicon Etcher (Inductively Coupled Plasma), 6"
- Manual wafer lock
- Low and high frequency ICP (Inductively Coupled Plasma) etch system.
- The ASE (Advanced Silicon Etch) process consists of alternating cycles of etching and protective polymer deposition to achieve high aspect ratios.
- The system can be used for deep Si trench etching of a single 6" [150mm] substrate
- Pumps are not included

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