Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch), 8"
- Process gases used: H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3
- Cryo Table w/ operating temp: -150 to 400C
- Substrate cooling: using liquid nitrogen (LN2)
- RF source 300 W, 13.56 MHz
- ICP source 3000 W, 13.56 MHz
- Base pressure: 5E-7 Torr
- Horiba Laser Endpoint Detector
- Load Locked
- Main Chamber Backing Pump: Adixen ADP 122P Dry pump
- Main Chamber Turbo Pump: Adixen ATH 1300 Turbo
- Load Lock: Adixen ACP 15G Dry pump
Refurbished to Meet OEM Specifications Consisting of:
- Chamber disassembled for refurbishment- Chamber received full wet clean
- Chamber o-rings and seals are replaced with brand new
- Electrostatic Chuck (ESC) sent out for refurbishment (if applicable)
- All MFCs rebuilt and calibrated professionally
- All corrosive gas lines replaced with brand new
- All Non-corrosive gas lines cleaned
- Vacuum pumps professionally rebuilt
- Turbo pump professionally rebuilt
- Chillers serviced and fully tested
- All wiring/wire harnesses are checked, repaired or replaced if needed
- All liquid and air lines, tubing and fittings checked and replaced if necessary
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed
- Checkout of all electronic and mechanical parts
- Machine covers are cleaned, polished or replaced as needed
- Equipment is fully tested to verify compliance to specifications
- Post-refurbishment system leak and RF calibration checks, with documentation provided
- System cycle and repeatability testing completed prior to cover replacement and wipe down
- System components carefully packed, labeled, and professionally crated
2009 Vintage