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Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 73037

Make: Oxford

Model: Plasmalab 100

Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
- 60Hz
- 208 VAC, Phase 3
- 50 Amps Max Input
- TEOS Option w End Frame Mounted Gas Pod
- Kit for single TEOS vapor delivery line
- Non-toxic gas line excluding mass flow controller MKS 1179A MFC with viton seals for non-corrosive applications for Argon
- Loadlock soft vent kit VCR
- Remote Emergency OFF switch box (for use with glove boxes, Dual chamber system etc.)
Main System:
- PECVD process chamber for 400°C electrode with single viewport, 100mm pumping port
- PECVD 240mm fixed height heated (ambient to 400°C) aluminum grounded lower electrode, with 3 pin lift (without wafer clamping)
- Electrical heating kit for PECVD process chamber walls
- Pumpdown pipe heating kit (100mm pumping tee)
- Heated foreline kit NW63
- System console 3 frame, PC base unit, 17" TFT, blue plc, PC2000 single chamber software
- Standard 208V 60Hz System power box
- 300W, 13.56MHz RF Generator & Air-vane capacitor Automatch Unit for PECVD
- 500W, 350kHz-460kHz Generator & Mixing filter to top electrode for dual frequency PECVD
- 2 Torr capacitance manometer
- 100mm pumping tee with 63mm branch to APC and isolation valve for use with PECVD electrodes (94-100-5-400BL and 94-100-5-700BL)
- 8 line (MAX 8 LINES) externally mounted gas pod
- 4 x Non-toxic gas line excluding mass flow controller
- 4 x MKS 1179A MFC with viton seals for non-corrosive applications Item 13 & 14 - For N2, N2O, O2 & CF4
- 2 x Toxic gas line with MFC bypass, excluding mass flow controller
- 2 x MKS 1479A MFC with metal seals for corrosive applications Item 15 & 16 - For SiH4 & NH3
- Gas pod support frame for system frame mounting (end mounted power box layout only)
- Alcatel ADS602P 208V 60Hz dry pump with rootes for PECVD (no purge kit required)
- Integration hardware for ADS6002P dry pump
- Alcatel ADP/ADS Dry Pump Display
- Foreline trap for high rate PECVD Systems
- Fixed wavelength endpoint detector for PECVD systems (704nm)
- Single wafer automatic insertion load lock including support frame and active priani gauge
- Alcatel ACP15G Load lock dry pump
- Integration hardware for A15CPF rotary pump or ACP15 dry pump, including flexible tubing
- Julabo FC1600T 230V 60Hz 1Ph Heater/Chiller 0/80 °C
2011 Vintage

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