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SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner
SUSS MA 8 / BA 8 Mask Aligner

SUSS MA 8 / BA 8 Mask Aligner

Asset #: 73028

Make: SUSS

Model: MA 8 / BA 8

SUSS MA 8 / BA 8 Mask Aligner
- Gen 3
Manual or motorized alignment stage with:
- automatic wedge compensation system in contact or without
contact between mask and wafer (with reference balls)
- alignment gap programmable from 1 to 1000 micron
- resolution 1 micron
- movement range mask aligner mode: X +/-5.0mm, Y +/- 5.0mm, Theta +/-5°
- movement range bond aligner mode: X +/-3.0mm, Y +/-3.0mm, Theta +/-3°
- reset movement to ZERO position after each exposure
Basic equipment consisting of:
- machine base frame with mechanical, pneumatic and electrical equipment
230V-50/60Hz
- one joystick X/Y- and THETA for alignment stage control
- Protection of mask and wafer when in contact by locking the motors to prevent stage movement
- TSA microscope stage with manual or motorized X-Y-manipulator and manual or motorized rotation for microscope
- with integrated microscope tilt for exposure and to create access for mask loading
- prepared for moveable exposure unit (necessary for BA function)
- manual loading and unloading of wafer, single substrates or substrate stack
- PLC control with LCD display, WINDOWS GUI - for wafer 1" up to 200 mm diameter
and substrates 2"x2" up to 8"x8" for lithography application - for wafer 3" up to 200 mm diameter
for bond application
- machine base frame made of aluminum profile with pneumatic dampers
- operator manual on CD
- prepared for BSA microscopes with working distance 33mm
- including adaption kit for Constant Dose exposure mode
- implemented tooling rack for tooling storage
Among other things to be ordered separately:
- manual or motorized alignment stage system
- TSA, BSA or IR microscope systems
- exposure unit, lamp, and optics
- adapter system for mask holders
- mask holders and exposure chucks
- bond adapter frame
- transport fixtures and bond align chucks
- MA8 Gen3 pneumatic expansion kit (BA/UV-NIL/SCIL/SMILE)
- additional pneumatics control needed for BA function, UV-NIL, SCIL and SMILE
- Housing MA8 BA8 GEN3 TSA/BSA
- Alignment Stage MA8BA8GEN3/WD-33/MOT/A-200
- X,Y,THETA-alignment stage for motorized operation, resolution 0,1 μm
- WEC Head for BSA microscope objective separation in X direction from 20mm to 210mm in combination
Operation Desk Mod - for joystick operation of motorized stages
Bottom Side Alignment System MA8 BA8 GEN3 /WD- 33/MOT
- BSA microscope stage X;Y prepared for motorized operation
- Pair of BSA microscopes
- 6mm motorized focus
- Switchable High (410x) and Low (128x) magnification
- Recipe programmable illumination
- Travel range Y: +/-22mm
- prepared with a Laser port to connect an IR welding Laser for stack thickness up to 7mm
- two 1/2" CCD video cameras
Karl Suss MA8 BA8 GEN3 M608 Microscope Lift Mot
- base system for the TSA microscope M608
- motorized microscope manipulator
- travel range: X:+/-14mm; Y:+18/-100; T:+/-5deg
- pneumatic lift of the top side microscope
M608 Microscope Illumination Set / DIC Modul Screen
- Only in combination with SUSS M608 SCREEN microscope
Suss IR M608 Screen Splitfield Microscope for MA8 BA8 GEN3 /AL400
- Combined with SUSS IR M608 Top Side Microscope the minimum X separation for alignment is 32mm
Suss M608 Nir Illumination for Transmitted Light
Adapted to BSA: Combined with SUSS IR M608 Top Side Microscope the minimum X separation for alignment is 32mm
Turret x2
Objective LMPL 5XIR/0.10 x2
- Working distance 20mm
- For infrared applications
Objective LMPL 10XIR/0.25 x2
- Working distance 18.5mm
- For infrared applications
Objective LMPL 20XIR/0.40 x2
- Working distance 8.1mm
Caution: movement only in the area of the mask holder opening due to low working distance
- For infrared applications
Exposure Unit LH1000 [MA8 BA8 GEN3]
- Lamp house for up to 1000W lamp
- Mirror house
- Pneumatic assembly
Lamp Adapter LH1000/1000W: to install 1000W lamp into LH1500
Lamp Power Supply Unit CIC 1200/LH1000
- Constant light intensity mode
- Constant power mode
- For the following DC lamps HG 200 W, HG 350 W/S, HG 500 W, HG-XE 500 W, HG 1000 W
- Operation of additional lamp with a current up to 35A possible (has to be specified and agreed upon)
- Easy operation due to microprocessor control
- Digital display of light intensity and lamp power simultaneously
- Integrated inlet for UV-probe for easy calibration
- Dual channel mode for 2-channel light sensors, with several wave-lengths
- Interlock for machine and lamp protection
- Single pulse ignition ensures gentle operation, provides easy lamp start and increases lamp durability
- For input voltages of 230V +/- 10% 50/60Hz
- Power consumption: max. 2300 VA
- Ignition box for LH1500
HG Lamp 1000W /USHIO
- High pressure mercury short arc UV exposure lamp
Optics UV400 / HR / LS/W-150 / LH1500 / MA8 BA8 GEN3
Suss 2-Channel Light-Sensor 365/405NM for CIC
Chuck MA6 /BA6 /VAC /BSA/W-100 /TEF
- For wafer dia. 100mm
- For proximity, soft - and vacuum contact exposures in combination with mask holder for proximity/contact processes
- For soft- and vacuum contact exposures in combination with mask holder for contact and proximity processes
- With 2 openings for viewing of alignment pattern X=32mm x Y=20mm
- Center position of openings Xl/r=±30mm Y=0 (relative to chuck center)
- With prealigner pins
- With Teflon coating
P Chuck MA6 /BA6 /VAC /BSA /GLASS /SPEC
- With glass insert for large bottom side IR viewing range
- For 100mm diameter wafers
- For proximity, soft and vacuum contact exposures in combination with mask holder for proximity/contact processes
- For soft and vacuum contact exposures in combination with mask holder for contact processes
Adapter System MA8 BA8 GEN3 for MA6 Mask Holder
- recommended for use with already existing mask holder MA6
- Adapter frame for UV NIL application
Mask Holder MA8 /BA6 /BL /PROX /CONT /M-5-6 / TH-1.5-6.5/W-100
- Bottom loading
- Contact/proximity wedge-error-compensation
- For masks 5" or 6"
- With a mask thickness from 1.5mm to 6.5mm
- Exposure opening for wafers dia. 100mm
- With stop pins
- With additional mechanical clamping
SUSS UV Optometer Case CPL.
- For intensity and intensity uniformity calculation
- Dose measurement functionality
- To be ordered with SUSS OPTOMETER probe (365/405nm: G187080)
- Storage case for measurement system and probes
SUSS UV Light Measuring Probe 365 /405NM for UV
Optometer
- Combined 2 channel probe 365/405nm
- Improved measurement accuracy and repeatability
- Improved shock resistance
- only in combination with SUSS UV Optometer (G207355)
Measuring Plate MA8 BA8 GEN3
Position Dial For Light Sensor [MA8GEN3]
Extended Video Alignment (Incl. Assisted + Auto Alignment)
- for video image via CCD cameras
- Assisted Alignment capability with CNL or PATMAX
- incl. Auto Alignment with CNL or PATMAX
2011 Vintage

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