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Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 71845

Make: Plasmatherm

Model: 790

Wafer Sizes: 8 inch

Last Confirm Date: June 12, 2023

Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition), 8"
- Asset HDD not included
- Hard drive will be reformatted, operating software is not included
- The system is not on-line
- Install Type is Stand-Alone.
- The equipment is suitable for processes of oxide, SiN, silicon, metal etch.
- The gas used contains O2, N2, CHF3, SF6.
- The pump is Lyebold (Model: D25BCS) and will be move out with the equipment.
- The chiller is NESLAB (model: CFT75) it is damaged and it will be moved out with the equipment
1995 Vintage

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