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Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 66084

Make: Plasmatherm

Model: 790

Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
- Non load-locked Single Chamber RIE
- Electrode: 240mm diameter
- Max wafer size capable: 8"/200mm
- System setup to process: 2" diameter InP wafers (see details below)
- RFPP 500W RF Generator
- 500W RF Match
- AMN Power Supply
- ION Gauge Controller Type 290
- Leybold 361C Turbo Pump (Qty 1)
- Leybold NT 150/360 Controller
- MKS 1160B MFCs (gas configuration listed below)
- Neslab Chiller
- Edwards QDP40 Dry Pump (or equivalent)
- MFC 1: Range: 200 SCCM, Gas: O2
- MFC 2: Range: 100 SCCM, Gas: H2
- MFC 3: Range: 20 SCCM, Gas: CH4
- MFC 4: Range: 200 SCCM, Gas: CHF3

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