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Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine

Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine

Asset #: 65090

Make: Applied Materials

Model: NAR 1200 L

Last Confirm Date: April 28, 2022

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Applied Materials NAR 1200 L Vertical In-Line Sputtering Machine
- Cycle Time: 40sec
- Glass Size: 730mm x 920mm
Vacuum Data:
- Entrance / exit chamber: < 2 E-02 hPa
- Transfer chamber: < 5 E-06 hPa
- Process chamber: < 5 E-06 hPa
Productivity:
- Throughput: 180 Substrates/h (2 subs/carrier)
- Target Utilization: > 40% ave
- Substrate Dims: 730mm x 920mm x (0.4 - 1.1) mm
- Carrier Dims: approx 1800 mmL / 1718 mmH
- No masking
- Pirani vacuum meter: 10-3 hPa to 1*10-3 hPa
- Ionization gauge range: 10-2 hPa to 1*10-9 hPa
- Capacitance vacuum meter sensor head range: 10-2 hPa to 10-4 hPa
- High vacuum pump set: Turbo-molecular pump Adixen ATH1603M
- Rough vacuum pumps: SP630 plus WSU 2001
- Mo cathode: DC power supply ADL 25 kw x 3
- Al cathode: DC power supply ADL 25 kw x 3
- Type: Planar cathode
- Material of backing plate: Ti, water cooled
- Magnetic field: Move mag
- Target fixing: bonding

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