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Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
Applied Materials NAR 1800 Vertical In-Line Sputtering Machine

Applied Materials NAR 1800 Vertical In-Line Sputtering Machine

Asset #: 65089

Make: Applied Materials

Model: NAR 1800

Last Confirm Date: April 28, 2022

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Applied Materials NAR 1800 Vertical In-Line Sputtering Machine
- Cycle Time: 40sec
- Glass Size: 730mm x 920mm
Vacuum Data:
- Entrance / exit chamber: < 2 E-02 hPa
- Transfer chamber: < 5 E-06 hPa
- Process chamber: < 5 E-06 hPa
Productivity:
- Throughput: 360 Substrates/h (four subs/carrier)
- Target Utilization: > 45% ave ITO planar targets
- Substrate Dims: 730mm x 920mm x (0.4 - 1.1) mm
- Carrier Dims: approx 1700 mmL / 2100 mmH
- No masking
- Pirani vacuum meter: 10-3 hPa to 1*10-3 hPa
- Ionization gauge range: 10-2 hPa to 1*10-9 hPa
- Capacitance vacuum meter sensor head range: 10-2 hPa to 10-4 hPa
- High vacuum pump set: Turbo-molecular pump Adixen ATH1603
- Rough vacuum pumps: SP630 plus WSU 2001
- ITO cathode: DC power supply ADL 25 KW
- SiO2 cathode: Mid frequency generator 50kw
ITO Cathode:
- Type: Planar cathode
- Material of backing plate: Ti, water cooled
- Magnetic field: Move mag
- Target fixing: bonding
SiO2 Cathode:
- Type: Rotary cathode, water cooled
- Material of backing tube: stainless steel
- Magnetic field: static magnet array
- Target: sprayed onto backing tube

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