{"product_id":"65020","title":"Lam \/ Novellus Concept Two CVD (Chemical Vapor Deposition)","description":"Lam \/ Novellus Concept Two CVD (Chemical Vapor Deposition), 6\"\u003cbr\u003e- Cassette Load Lock Modules \u003cbr\u003e- With 3 cassettes, a Motion Engineering Inc (MEI) 3 axis single arms robot\u003cbr\u003e- Leybold TMP\/NT 150\/360V\/H turbo pump \u003cbr\u003e- Desorb Modules For wafer orientation and lamps heating\u003cbr\u003e- Leybold TMP\/NT 150\/360V\/H turbo pump\u003cbr\u003e- Transport Modules \u003cbr\u003e- Brooks MultiTran 5 Bi-symmetric frog-leg type dual arm robot\u003cbr\u003e- Leybold TMP 151\/361, 600 and 1000 turbo pump\u003cbr\u003e- PVD Cathode \u003cbr\u003e- AE MDX Magatron Drive Power Supply\u003cbr\u003e- CTI cryo on board 8 and 8300 compressor\u003cbr\u003e- VAT Gate valve series 14 AlCu target 14” diameter\u003cbr\u003e- PVD Cathode \u003cbr\u003e- Same as 4. TaAl target 14” diameter\u003cbr\u003e- Al, Ta Sputtering Process \u003cbr\u003e- The C2 uses Ta-Al, Al-Cu targets for PVD sputtering on 6 inches wafers.  - The film is Ta-Al 1100 Ao, Al-Cu 5200 Ao\u003cbr\u003e- Production run rate = 75 wafers every pump down (2 hrs.) \u003cbr\u003e- The machine does about 5-6 pump down on a 12 hours shift (about 375-450 wafers output per shift or 750-900 wafers per day) \u003cbr\u003e- The current layout is Loadlock, Orienter \/ Desorb, Transport, 2 Process Chambers\u003cbr\u003e- More process chambers can be added depending on process needs\u003cbr\u003e- Each process chamber is equipped with an on-board 8 CryoPump","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44815731884222,"sku":"65020","price":0.0,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/1-done-44_a22007dd-85d0-40cf-b805-892884255841.jpg?v=1737557106","url":"https:\/\/www.bridgetronic.com\/products\/65020","provider":"Bridge Tronic Global","version":"1.0","type":"link"}