FirstNano EasyTube ET 6000 Horizontal Furnace Atmospheric System, 6"
- Tube # 1 – Atmospheric Wet or Dry Oxidation using Nitrogen,
Oxygen, Hydrogen and a Trans-LC Bubbler at temperatures
up to 1200° Celsius
- Tube # 2 – LPCVD of Silicon Nitride using Nitrogen, Ammonia
and Dichlorosilane at temperatures up to 850º Celsius
- Tube # 3 – LPCVD of Silicon Dioxide using Nitrogen, Oxygen
and a TEOS Bubbler at temperatures up to 800º Celsius
- Tube # 4 – LPCVD of Polysilicon using Nitrogen and 2%
Silane at temperatures up to 650º Celsius
System Features
- Through-the-Wall Sleeve Assembly
- Process up to twenty five (25) - 150mm or 100mm diameter
wafers in each tube
- Microprocessor Control System
- Mass Flow Controlled Gas System
- Low Pressure Vacuum Control System for Tubes 2, 3 and 4
- Trans-LC Liquid Source Vapor Delivery System for Tube # 1
- TEOS Liquid Source Vapor Delivery System for Tube # 3
- Standby State for LPCVD Tubes – Allows LPCVD tubes to
be kept at low temperature and to minimize Nitrogen usage
- Laminar Flow HEPA filtered Loading Station
- Cantilevered Loading – no particulate generation
- Comprehensive Safety System
- SEMI S2, S8 and CE Compliant
2017 Vintage