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Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)

Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)

Asset #: 61526

Make: Aixtron

Model: Crius II

Last Confirm Date: March 21, 2022

Aixtron Crius II MOCVD (Metal Organic Chemical Vapor Deposition)
- Process: GaN
- Batch size: 2" * 55ea/ 4" * 13ea/ 6" * 6ea
- Electricity: 208/120V AC, 3 Phase
- Heater voltage: 380V AC, 3 Phase
- Wiring: 4 wire + ground
- Temperature monitor: ARGUS x1
- Hydride lines: NH3_1 / NH3_2 / SiH4
- MO Source:  TMGa-1,TMGa-3,TEGa2, Cp2Mg-1, Cp2Mg-2,
TMIn-1, TMAl-1 (7)
- Bath:
- 2 sets of RE235 RAUDA bath
- 4 sets of NOAH Precision
- MFC type: Horiba Z500
- Pump: Scroll pump *1
- Chiller: Affinity
2010 Vintage

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