{"product_id":"57991","title":"GSI Lumonics UltraDep 2000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)","description":"GSI Lumonics UltraDep 2000 PECVD (Plasma-Enhanced Chemical Vapor Deposition), 4\", 6\"\u003cbr\u003e- Load locked tool, single wafer load\u003cbr\u003e- 400C max process temp\u003cbr\u003e- Dual Frequency RF supply for stress control (13.56 MHz and 200 KHz)\u003cbr\u003e- Microprocessor\/computer controlled\u003cbr\u003e- Configured with Helium, nitrus oxide, ammonia, silane, TEOS (direct liquid inject), PH3\/He dopant mix, B2H6\/He dopant mix, hydrogen, oxygen and CF4 gases.\u003cbr\u003e-This gives the capability of Silane Oxides, TEOS Oxides, Stress controlled Silicon Nitrides, Doped oxides (PSG, BPSG, BSG), amorphous silicon and doped amorphous silicon films\u003cbr\u003e- spare parts also included (MFCs, hot plates, etc.)\u003cbr\u003e2000 Vintage","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44806694895806,"sku":"57991","price":0.0,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/GSI_PECVD-done.jpg?v=1737104810","url":"https:\/\/www.bridgetronic.com\/products\/57991","provider":"Bridge Tronic Global","version":"1.0","type":"link"}