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Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher)
Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher)
Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher)
Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher)

Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher)

Asset #: 57551

Make: Strasbaugh

Model: 6 EH nTrepid

Wafer Sizes: 6 inch

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Strasbaugh 6 EH nTrepid CMP (Chemical Mechanical Polisher), 6"
- Silicon Oxide, Poly-Si, a-Si
Polishing section:
- Load and unload stations
- 2 main polishing platens
- Rinse station
- Buff table
FEM section:
- Open cassette loaders
- Wet wafer output basin with cart interface mechanism
- Wet/dry transfer station
- Wet buffer station
- Robot to move wavers
Wafer Size Capabilities:
- 150mm round wafers - 1 Flat only, Flat length = 57.5mm +/- 2.5mm
- Wafer thickness #1 = 680 microns +/- 15 microns
- Wafer thickness #2 = 380 microns +70/-10 microns
nVision Endpoint Detection:
- Table motor current- Spindles A and B are equipped with spindle motor current endpoint
- Pad temperature
Electrical
- 208 Volt / 3 Phase / 50 to 60 Hertz
- Main circuit breaker: 150 Amps
- FLA (Full Line Amperage): 80
Computing Platform:
- Industrial PC running Windows XP and Adventa ControlWORKS for Graphical User Interface, recipe
editing and execution, event scheduling, and material tracking
- Giddings and Lewis Programmable Logic Controllers (PLC’s) for real-time movement control
2007 Vintage

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