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SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)
SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)

SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma)

Asset #: 57039

Make: SPTS / STS

Model: MACS

Wafer Sizes: 8 inch

Last Confirm Date: August 25, 2020

SPTS / STS MACS ICP Etcher (Inductively Coupled Plasma), 8"
- Advanced Silicon Etch (ASE) with Bosch process
- HR Chamber for High Rate Etch
- Set up for 200mm wafer (150mm-200mm capable)
- MACs Loader for Cassette to Cassette operation (2 load stations)
- Carousel vacuum load lock
- Helium Backside Cooling (HBC)
- HBC Assy: ICP V2
- Clamp Type: Standard WTC
- Lower Electrode: ICP WTC Tripod Lift
- Chamber Insulation Jackets: None
Chiller: Affinity
Vacuum System:
- Turbo Pump: LEYBOLD MAG 2000
- Load Lock Pump: EBARA AA10
- Chamber Pump: EBARA A30W
Gases: C4F8(200 sccm)、SF6(1000 sccm)、O2(2000 sccm)、N2 (500 sccm)
RF Generators:
- Coil RF Power : ENI GHW-50Z 5kw
- Platen RF Power : ENI ACG-3B 13.56MHZ, 300W
2003 Vintage

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