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Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 56981

Make: Oxford

Model: PlasmaPro NGP 1000

Wafer Sizes: 8 inch

Oxford PlasmaPro NGP 1000 PECVD (Plasma-Enhanced Chemical Vapor Deposition), 8"
- Load Locked Chamber
- System PC, Keyboard, Mouse
- Windows 7 w/ PC4000 Software
- 490mm Diameter Aluminum Lower Electrode
- Up to 400 degrees Celcius
- Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition)
- Dual Frequency RF with Pulsing for Film Stress Control
- 600W 13.56Mhz HF RF Generator
- 600W 2Mhz LF RF Generator
- Pneumatic Chamber Lift Kit
- Adixen ADS602P Dry Pump for Process Chamber
- Adixen ACP40G for Load Lock
- Operations Manual and Documentation
- X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: He / CF4 / N2 / N20 / NH3 / SiH4-N2
2012 Vintage

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