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Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 55517

Make: Applied Materials

Model: P 5000

Applied Materials P 5000 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
- Depo Rate: Oxide 6000β„«/min
- Uniformity: 5% ↓
Gases: 12 Line:
- GAS 1 200 sccm Sih4
- GAS 2 100 sccm NH3
- GAS 3 3000 sccm N2
- GAS 4 2000 sccm N20
- GAS 5 2000 sccm CF4 or SF6
- GAS 6 n/a
- GAS 7 200 sccm Sih4
- GAS 8 100 sccm NH3
- GAS 9 3000 sccm N2
- GAS 10 2000 sccm N2O
- GAS 11 2000 sccm CF4 or SF6
- GAS 12 n/a
AC Power:
- AC input (208volts,3Phase 5wires : 200A)
- Fuse for AC/DC power box.
- 1.2 kw and 13.56 Mhz RF Power Supply.
Mainframe Configuration:
- Mark β…‘
- 150mm
- I/O Wafer Sensor
- 21slot VME
- Phase 3 Robot
- Phase 3 Cassette Handler
- 8 Slot Storage Elevator
- Viton O-ring all change.
- Standard clean gas box installed.
- Software version 4.26
Pressure control system:
- Throttle valve
- Isolation valve open/close type
Temp control: Lamp Heated
Vacuum system (option):
- Chamber : QDP80+QMB500 Pump.
- Load lock chamber : ADP80
*Pumping Line & Regulator Not Included
Dimension & Facility:
- Physical Dimensions
- Power Requirements
- Exhaust Requirements
- Cooling Water
- Nitrogen
- Compressed Air (CDA or N2)

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