{"product_id":"47964","title":"SSEC M 3302 Resist Removal and Wafer Cleaner","description":"SSEC M 3302 Resist Removal and Wafer Cleaner\u003cbr\u003eTwo modules:\u003cbr\u003eFirst module, the wafer is soaked in the mix of solvents (cleaning by submersion).\u003cbr\u003eSecond module, there is  processing by spray solvents (Fan Spray Processing) and nitrogen drying stage. \u003cbr\u003e  \u003cbr\u003eAs solvents N- methylpyrrolidone  (NMP) and isopropyl alcohol (IPA) were used. The unit has dry-in\/dry-out system  (dry wafers in\/ dry wafers out)","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44814253686974,"sku":"47964","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/1-5_c021b892-f8e7-4cca-b881-e2ed74f8d17e.jpg?v=1737492306","url":"https:\/\/www.bridgetronic.com\/products\/47964","provider":"Bridge Tronic Global","version":"1.0","type":"link"}