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SSEC M 3302 Resist Removal and Wafer Cleaner
SSEC M 3302 Resist Removal and Wafer Cleaner
SSEC M 3302 Resist Removal and Wafer Cleaner
SSEC M 3302 Resist Removal and Wafer Cleaner

SSEC M 3302 Resist Removal and Wafer Cleaner

Asset #: 47964

Make: SSEC

Model: M 3302

Last Confirm Date: May 28, 2019

SSEC M 3302 Resist Removal and Wafer Cleaner
Two modules:
First module, the wafer is soaked in the mix of solvents (cleaning by submersion).
Second module, there is  processing by spray solvents (Fan Spray Processing) and nitrogen drying stage.
  
As solvents N- methylpyrrolidone  (NMP) and isopropyl alcohol (IPA) were used. The unit has dry-in/dry-out system  (dry wafers in/ dry wafers out)

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