{"product_id":"45031","title":"Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)","description":"Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)\u003cbr\u003eOptional Accessories:\u003cbr\u003e- Edwards iGX100N Pump\u003cbr\u003e- Alcatel ATH 1600M Pump\u003cbr\u003eKnown Problems:\u003cbr\u003e- The roughing valve for the main chamber is leaking. This is a recent issue\u003cbr\u003eand it has not been addressed yet as the chamber vacuum is still reasonable\u003cbr\u003efor etch processes (around 10E-6 Torr).\u003cbr\u003e- Heating for the pump-down line is not operational due to a broken\u003cbr\u003econtroller. This does not affect the processes.\u003cbr\u003e- The wafer transition to the system is not reliable and to address this we are\u003cbr\u003eusing 6 inch Al plates to fix our wafers and samples on. This is not optimal for\u003cbr\u003esample cooling but it works well for us and we currently do not experience\u003cbr\u003ewafer mishandling.\u003cbr\u003e- We currently operate the wide temperature electrode only at room\u003cbr\u003etemperature as the system operation at other temperatures was unreliable\u003cbr\u003eand presently we do not really need sample processing at other\u003cbr\u003etemperatures.\u003cbr\u003e2013 Vintage","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44814100136126,"sku":"45031","price":0.0,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/7-1_a4fe1879-68ed-4825-b25a-dbb61c4a35b6.jpg?v=1737487080","url":"https:\/\/www.bridgetronic.com\/products\/45031","provider":"Bridge Tronic Global","version":"1.0","type":"link"}