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Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)

Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)

Asset #: 45031

Make: Oxford

Model: Plasmalab 100

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Oxford Plasmalab 100 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Optional Accessories:
- Edwards iGX100N Pump
- Alcatel ATH 1600M Pump
Known Problems:
- The roughing valve for the main chamber is leaking. This is a recent issue
and it has not been addressed yet as the chamber vacuum is still reasonable
for etch processes (around 10E-6 Torr).
- Heating for the pump-down line is not operational due to a broken
controller. This does not affect the processes.
- The wafer transition to the system is not reliable and to address this we are
using 6 inch Al plates to fix our wafers and samples on. This is not optimal for
sample cooling but it works well for us and we currently do not experience
wafer mishandling.
- We currently operate the wide temperature electrode only at room
temperature as the system operation at other temperatures was unreliable
and presently we do not really need sample processing at other
temperatures.
2013 Vintage

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