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Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)

Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)

Asset #: 33415

Make: Pfeiffer / Alcatel

Model: Speeder 100 Si

Wafer Sizes: 4 inch

Last Confirm Date: December 19, 2018

Pfeiffer / Alcatel Speeder 100 Si ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher), 4"
- Bosch Deep Si Etching
- Mechanical Clamp with the backside cooling for precise temperature control
- Chuck Temperature is controller using Liquid Nitrogen (LN2)
- Gasses: C4F8, SF6, 02
- HF and LF Etching possible

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