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Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 30560

Make: Vacutec

Model: -

Last Confirm Date: November 09, 2017

Vacutec RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
- Two, Chamber Etch & Deposit
- PECVD: SiNx Deposition
- RIE: SiNx Etch
- Gas Lines PECVD: SiH4, Ar, N2, NH3, SF6
- Gas Lines RIE: Ar, O2, CF4, SF6
- Pumps: with Rotary and Rootsblower (1), with Rotary and Turbo (1)
- RF Generator: ENI ACG5 500W
- Including Sofie Camera for endpoint detection.
- The control software is not working

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