{"product_id":"25750","title":"STS ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)","description":"STS ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)\u003cbr\u003e- Brooks Dealer\u003cbr\u003e- Dry Etching for III-V Semiconductors\u003cbr\u003e- Gasses: Cl2, BCl3, N2, Ar, O2, CF4\u003cbr\u003e- Sources:300W (platen) and 1000W (coil) RF sources\u003cbr\u003e- Cooling system: Helium backside flow\u003cbr\u003e- System layout: Main chamber with Loadlock\u003cbr\u003e- Chuck: Max. 180°C heated substrate electrode, Electrostatic clamping\u003cbr\u003e- Process information: GaN, InP, GaAs, etc.\u003cbr\u003e- Up to 4\"","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44812623282366,"sku":"25750","price":0.0,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/image-done-1.jpg?v=1737444121","url":"https:\/\/www.bridgetronic.com\/products\/25750","provider":"Bridge Tronic Global","version":"1.0","type":"link"}