{"product_id":"16883","title":"Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)","description":"Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition), 4\" to 8\"\u003cbr\u003e- Includes Modular Remote Frame\u003cbr\u003e- Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel. \u003cbr\u003e- Integrated endpoint system with 2 monochromators. \u003cbr\u003e- Currently configured for 100mm wafers\u003cbr\u003e- System is fully configurable to your specifications\u003cbr\u003e- Chamber 1: MxP Etch chamber configured for 100mm clamped Oxide process. \u003cbr\u003e*Leybold Mag lev Turbo pump \u003cbr\u003e*Phase IV RF match \u003cbr\u003e*Heated gate valve\/throttle valve \u003cbr\u003e*ENI OEM 12 RF Generator\u003cbr\u003eCan be configured from 100-200mm.\u0026lt;\u003cbr\u003e- Chamber 2: MxP Etch chamber configured for 100mm clamped Poly process.\u003cbr\u003e*Leybold Mag lev Turbo pump \u003cbr\u003e*Phase IV RF match \u003cbr\u003e*Heated gate valve\/throttle valve \u003cbr\u003e*ENI OEM 12 RF Generator.\u003cbr\u003eCan be configured from 100-200mm.\u003cbr\u003e- Chamber 3: no description offered\u003cbr\u003e- Chamber 4: Standard Lamp Heated (100-150mm capable) Configured for 100mm Nitride Process.\u003cbr\u003e*Includes DPA and DPA generator \u003cbr\u003e*Phase IV RF match \u003cbr\u003e*ENI OEM 12 RF Generator Can be configured from 100-150mm.","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":44812484575422,"sku":"16883","price":0.0,"currency_code":"USD","in_stock":true}],"url":"https:\/\/www.bridgetronic.com\/products\/16883","provider":"Bridge Tronic Global","version":"1.0","type":"link"}