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Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 16882

Make: Plasmatherm

Model: 790

Last Confirm Date: March 10, 2017

Plasmatherm 790 RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)
- Refurbished PECVD System with 11" Electrode
-Single Chamber
- Generator: RFPP 5S
- Process gasses: SF6, Ammonia, Nitrogen
- Power Requirements: 208 V 60 Hz 3 Phase
- Dimensions: Width 24.000 in (61.0 cm) / Depth 40.000 in (101.6 cm) / Height 69.000 in (175.3 cm) / Weight 604 lb (274 kg)
- Resistive heated lower electrode up to 350 C watlow temperature controller
- Cooling/heating circuit in chamber walls
- MKS throttle valve pressure control
- VAT Al body gate valve assembly--ISO 100
- 2 torr manometer
- Windows 98 Operating System
- Process Gases--All MFCs will be cleaned and calibrated to NIST standards:
2-N2 500sccm
2-N2 1000sccm
1-SF6 50sccm
1-Ammonia 20sccm
- Operating manuals and related documentation included.
- Vacuum pump and chiller are not included.


1998 Vintage

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