Oxford Plasmalab 100 PECVD-TEOS (Plasma-Enhanced Chemical Vapor Deposition - Tetraethyl Orthosilicate), 8"
- with Load Lock
- Power requirements 208 V 25.6 A 50/60 Hz 3 Phase
- Loadlock Pump: Alcatel APT 80 Turbo, ACT 200T Controller
- RF Generator: AE LF5 & AE RFX 600A
- Advanced Energy LF-5--RF Generator
- Advanced Energy RFX 600A--RF Generator
- Process Gases
CF4 80%, O2 20%--500 SCCM---MKS 1179A
Ar 90%, PH3 10%--50 SCCM---MKS 1479A
Ar 90%, GeH4 10%--50 SCCM---MKS 1479A
Ar 90%, BeH6 10%--50 SCCM---MKS 1479A
N2 95%, SiH4 5%--1 SLM---MKS 1479A
NH3 100%--100 SCCM---MKS 1479A
N2O 100%--3 SLM---MKS 1179A
N2O 100%--200 SCCM MKS 1179A
N2 100%--2 SLM MKS 1179A
O2 100%--500 SCCM MKS 1179A
- System will be fully functional and source inspection to be performed at our facility with inert gases
- Refurbishment to include but not limited to the following;
Cleaning and recalibration of MFCs
Inplace wet cleaning. As option chamber and associated hardware can be sent high purity cleaning
2001 Vintage