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Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP
Applied Materials Centura 5200 MxP

Applied Materials Centura 5200 MxP

Asset #: 158080

Make: Applied Materials

Model: Centura 5200 MxP

Last Confirm Date: September 01, 2026

Applied Materials Centura 5200 MxP
- 3 Ch
- Mainframe: SHO
- Gas Panel Purity UHP
- Gas Panel Type: Standard
- OTF Centerfinder
- 208 VAC, 3 Phase, 240 A, 50/60 Hz
- System Controller: Standard
- Fab Installation: TTW
- System Umbilicals: 50 ft - standard
- Y 2k Compliant
- Heat Exchanger Type 1: AMAT 0
- Heat Exchanger Type 2: Neslab
- Loadlock pump: Ebara
- Pump Size: A 10
- I/O Slit Valve Type: Viton
- HF RF Gen Type: ENI OEM 12B-3
- Etch RF Match Type: Phase 4
- FAB Monitor: TTW
- Chase Monitor
- Liquid Delivery: None
- LF RF Gen Type: None
- No Subfab Monitor
Chamber A: MXP
- Uni-lid
- Heated Pumpstack
- VAT gate valve
- ESC
- Enclosed Cathode
- Seiko Seiki Turbo
- Slit Valve Type: Anodized
- Chamber A Process: Oxide
- Process Kit Type: Oxide Etch ESC
- Chamber Pump: Ebara
- Pump Configuration: A30
- Pedestal Type: Electostatic Chuck
- Turbo Pump: Seiko-Seiki
- Heated Pump Stack
- Endpoint System
- Endpoint type: Monochromator
- Chamber Clamps: No
- Process Kit Size: 200 mm Notch
- O-ring Kit Type: Chemrez
- Throttle Valve Type: HRTV
- Manometer: Single
- Manometer type 1: 1 Torr
- Cathode Cooling: Neslab
- Wall Cooling: AMAT 0
Chamber B: MXP
- Uni Lid
- Heated Pumpstack
- VAT Gate Valve
- ESC
- Enclosed Cathode
- Seiko Seiki Turbo
- Missing Front Shield
- Slit valve type: Anodized
- Chamber pump: Ebara
- Pump Configuration: A 30
- Chamber B Process: Oxide
- Process Kit Type; Oxide Etch ESC
- Process Kit Size: 200 mm Notch
- O-ring Kit Type: Chemrez
- Pedestal Type: Electostatic Chuck
- Turbo Pump:Seiko-Seiki
- Heated Pump Stack
- Endpoint System
- Endpoint Type: Monochromator
- No Chamber Clamps
- Throttle Valve Type: HRTV
- Manometer Config: Single
- Manometer Type 1: 1 Torr
- Cathode Cooling: Neslab
- Wall Cooling: AMAT0
Chamber C: MxP
- Uni Lid
- Heated Pumpstack
- VAT Gate Valve
- ESC
- Enclosed Cathode
- Seiko Seiki Turbo
Slit Valve Type: Anodized
- Chamber Pump: Ebara
- Pump Configuration: A30
- Pedestal Type: Electostatic Chuck
- Chamber Process: Oxide
- Process Kit Type: Oxide Etch ESC
- Process Kit Type: Chemrez
- Throttle Valve Type: HRTV
- Turbo Pump: Seiko-Seiki
- Heated Pump Stack
- Endpoint System
- Endpoint Type: Monochromator
- Manometer Config: Single
- Manometer Type 1: 1 Torr
- Cathode Cooling: Neslab
- Wall Cooling: AMAT 0
- No Chamber Clamps

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