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Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 152305

Make: Oxford

Model: Plasmalab 100

Last Confirm Date: April 02, 2026

Oxford Plasmalab 100 PECVD (Plasma-Enhanced Chemical Vapor Deposition)
- Dry pump: Edwards QDP 40
- System Control: HP PC System, Windows XP
- 208 VAC, 3 Phase
- Full Load: 25 A
Gas Box:
- Gas 1: MKS 1479 A, 5% SiH4 / N2, 1000 SCCM
- Gas 2: MKS 1479 A, NH3, 100 SCCM
- Gas 3: MKS 1179 A, N2, 2000 SCCM
- Gas 4: MKS 1179 A, N2O, 3000 SCCM
- Gas 5: MKS 1179 A, ,O2, 300 SCCM
- Gas 6: MKS 1179 A, Ar, 500 SCCM (TEOS carrier gas)
- TEOS Thermotank: Thermocenter salvis lab
Chamber:
- Chuck: Ο†202 mm( Ο†2’, Ο†4’, Ο†6’, Ο†8’)
- Shower head: Ο†225 mm
RF System:
- RF Generator: AE RFX 600 A
- Match Box: OPT AMU Oxford
- LF Generator: AE LF-5
- Match Box: Manual Transfor UP
Pressure Control:
- Valve: VAT 12036-PA 4
- MKS valve control: 253 B
Turbo Pump:
- Alcitel ACT 200 T Control Unit
- Alcitel ATP 80/ 100 Turbo Pump
LL Chamber:
- Ο†2’, Ο†4’, Ο†6’, Ο†8’ single wafer auto transfer
- Slit Valve:VAT 02110 BA 24 AQZ 1
- Pirani Gauge: Edwards APG-L-NW 16
- Vacuum Gauge: Edwards AIM-S-NW 25

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