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Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)
Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Asset #: 152249

Make: Applied Materials

Model: P 5000 Mark II

Wafer Sizes: 6 inch

Last Confirm Date: April 13, 2026

Applied Materials P 5000 Mark II PECVD (Plasma-Enhanced Chemical Vapor Deposition), 6"
- Refurbished
- Silane PECVD
- Center finder board retrofitted for transparent & opaque substrates
- Install Type: Through Wall
- All cables present
- Wafer Orienter
- Phase 3 Robot
- Phase 3 Cassette Handler
- Bolt Down Lid
- Storage Elevator: 29 slots
- Expanded (21 Slot) VME
- Floppy Drive: 3 1/2
- Mini Controller
- Gas Panel Type: 28
- CES Gas Panel
- RF Generator Rack
- Remote Frame w/AC Box
- Load Lock Pump: Edwards iH 80 Series
- Applied Materials Heat Exchanger
- No CE Mark
- No Electrostatic Chuck
- No Independent Backside He Cool
- No VDS (Vapor Delivery System)
- No Signal Lamp Tower
- No Bolt on SMIF
- No Stand Alone Endpoint System
Chamber Type:
- Position A: Silane DCVD
- Position B: Silane DCVD
- Position C: Silane DCVD
- Position D: Empty
Chamber Lid Details:
- Position A: OEM 12 B
- Position B: OEM 12 B
- Position C: OEM 12 B
Front of System:
- Ch F (C)
- Ch E (C)
- Ch D
- Ch C
- Ch B
- Ch A
CVD Chamber Items:
- RF Match Type: Phase IV
- Lid Type: Bolddown
- Endpoint: Standard
- Cathode Type Susceptor
- Lid Gas Distribution GDP
- No Chamber Liner
- No Autobias
- No Slit Liner Door
Gas:
- Line 1: N2, 3000 sccm, Brooks 5850 / 5964
- Line 2:He, 5000 sccm, Ditto
- Line 3: N2O, 3000 sccm, Ditto
- Line 4: NH3, 200 sccm, Ditto
- Line 5: 2% SiH4 / Bal He, 5000 sccm, Ditto
- Line 6: CF4, 1600 sccm, Ditto
- Line 7: N2O, 50 sccm, Ditto
2010 Vintage

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