{"product_id":"152107","title":"Plasmatherm SLR System VII RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition)","description":"Plasmatherm SLR System VII RIE-PECVD (Reactive Ion Etcher - Plasma-Enhanced Chemical Vapor Deposition), 4\", 6\", 8\"\u003cbr\u003e- Wafer Auto Load \/ Unload\u003cbr\u003e- Wafer on Plate: 200 mm\u003cbr\u003e- Chuck: 200 mm\u003cbr\u003e- Shower: 280 mm\u003cbr\u003e- Vacuum Gauge: MKS 141A, 10 torr\u003cbr\u003e- Vacuum Control: MKS 286\u003cbr\u003e- Heater Control Watlow 808\u003cbr\u003e- Pump: Leybold D65BCS\u003cbr\u003e- System Control: PC Control\u003cbr\u003e- Transfer System: Auto to Chamber\u003cbr\u003eGas Box:\u003cbr\u003e- Gas 1: MKS, N2, 200 SCCM\u003cbr\u003e- Gas 2: Brooks 5850E, N2, 1000 SCCM\u003cbr\u003e- Gas 3: MKS, N2, 200 SCCM\u003cbr\u003e- Gas 4: UFC-1200A, N2, 100 SCCM\u003cbr\u003e- Gas 5: Brooks 5850E, N2, 2000 SCCM\u003cbr\u003ePECVD RF System:\u003cbr\u003e- Generator: RF 5\u003cbr\u003e- Match Box: Auto Matching Network, 2000 Watt, 13.56 MHZ\u003cbr\u003ePECVD Pressure Control:\u003cbr\u003e- MKS 252\u003cbr\u003e- MKS Valve Control: 4327.894\u003cbr\u003e- Main Valve VAT F12-67923-02\u003cbr\u003ePECVC Pump\u003cbr\u003e- Leybold D65BCS\u003cbr\u003eRIE Gas Box:\u003cbr\u003e- Gas 1: MKS, N2, 50 SCCM\u003cbr\u003e- Gas 2: UFC-1200, N2, 100 SCCM\u003cbr\u003e- Gas 3: Brooks 5850E, NH3, 100 SCCM\u003cbr\u003e- Gas 4: UFC-1100A, N2, 100 SCCM\u003cbr\u003e- Gas 5: MKS, N2, 100 SCCM\u003cbr\u003e- Gas 6: Brooks 5850E, H2, 100 SCCM\u003cbr\u003e- Gas 7:MKS, N2, 100 SCCM\u003cbr\u003eRIE Chamber: \u003cbr\u003e- Wafer Auto Load \/ Unload\u003cbr\u003e- Wafer on Plate: 200 mm\u003cbr\u003e- Chuck: 220 mm\u003cbr\u003e- Shower: 280 mm\u003cbr\u003e- Ion Gauge Mask\u003cbr\u003eRIE RF System:\u003cbr\u003e- Generator: RF-10\u003cbr\u003e- Match Box: 7610807010 Network, 1000 Watts, 13.5 MHZ\u003cbr\u003eRIE Pressure Control:\u003cbr\u003e- MKS Control Valve\u003cbr\u003e- Valve Control: MKS\u003cbr\u003e- Main Valve VAT F12-60366-390\u003cbr\u003eRIE Turbo Pump:\u003cbr\u003e- Leybold NT 150\/360 Control Unit\u003cbr\u003e- Leybold 360V Turbo Pump\u003cbr\u003ePower: \u003cbr\u003e- 208 V\u003cbr\u003e- 90 A\u003cbr\u003eProcess Specif:\u003cbr\u003e- Pressure: 5-10 mTor to 1 Tott\u003cbr\u003e- RF Power: 500 \u0026amp; 1000 w (max)\u003cbr\u003e- Wafer Size: 200 mm, 150 mm, 100 mm\u003cbr\u003e- Uniformity: ≤±5% for all wafer sizes\u003cbr\u003e- Repeatability: ≤±5% (w-t-w)","brand":"Bridge Tronic Global","offers":[{"title":"Default Title","offer_id":46539265015998,"sku":"152107","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0651\/6175\/6862\/files\/Plasmatherm_1_1488b055-86d2-44ab-94bf-dc13dd59a7f0.jpg?v=1774647091","url":"https:\/\/www.bridgetronic.com\/products\/152107","provider":"Bridge Tronic Global","version":"1.0","type":"link"}