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Applied Materials Centura AP Ultima X HDP-CVD (High-Density Plasma - Chemical Vapor Deposition)

Asset #: 151966

Make: Applied Materials

Model: Centura AP Ultima X

Wafer Sizes: 12 inch

Last Confirm Date: April 13, 2026

Applied Materials Centura AP Ultima X HDP-CVD (High-Density Plasma - Chemical Vapor Deposition), 12"
- AP Centura Mainframe - Metal Buffer Lid
- Process Chambers (3):
- MKS iAstron Remote Plasma Source
- Gas Ring Compromised of Ceramic Gas
- 15 Stick AP Gas Box per Process Chamber
- HDD not included
Nozzle
- Ceramic Center Gas Nozzle / Baffle
Ceramic Electrostatic Chuck
- Biasing RF Capability
- Backside He
- Water Cooling
- Wafer Temperature Monitor
Factory Interface:
- Kawasaki Factory Interface Robot
- 3 N2 Load Ports
RF Generators per Process Chamber:
- Top, Side, and Bias
- 9 Generators total
Vacuum System per Process Chamber:
- Stepper Turbo Throttle Valve with 3 Veins
- Pendulum Gate Valve
- Turbo Pump

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