KLA Candela 8520 Wafer Inspection System, 6"
- 1 Phase
- 3 Wire
- 230 V
- 20 amps
- 50/60 Hz
- Wafer Thickness 350μm ~ 1100μm
- Wafer Carrier 2 FUP 6 and 8
- Wafer Mapping Micro Optical Sensor
- SECS-GEM Interfaces
CDA Pressure: 100 psi / 689 KPa (± 10% range)
- Flow: 2 SCFM / 80 L/min (± 10% range).
- AMC: maximum concentration of Volatile Organic Compounds (VOC) must be less than 150 ng/l.
- Anions must be less than 14 ng/l. Cations must be less than 10 ng/l.
- Moisture Content: less than 20 PPM at 1.0 atm, corresponding to a dewpoint of -30° Celsius (-22°F).
Vacuum Pressure: -680 mm Hg / -90 KPa (± 10% range).
- Flow: 0.64 SCFM / 18 L/min (± 10% range).
The Candela 85 XX uses two lasers
- 405 nm wavelength, 60 mW power (Class IIIb per CDRH 21CFR 1040).
- 355 nm wavelength, 20 mW power (Class IIIb per CDRH 21CFR 1040).
2022 Vintage